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📄 test

📁 用fortran和C写的薄膜生长模拟程序
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 ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~
 
                     KLMC SIMULATION OF CU THIN FILM GROWTH 
                                   ON CU   
                       -- by using the code version 1.1 --
   by Zhiyong Wang, Youhong Li and James B. Adams at Arizona State University
 -------------------------------------------------------------------------------
 
 The Simulation Began at: 11: 6:56.  0 on  5/ 9/2002
 The Simulation End at:   11: 8:23.  0 on  5/ 9/2002
 -------------------------------------------------------------------------------
 
 The Simulation Conditions Are:       (AE --- activation energy)
 -------------------------------------------------------------------------------
 
 The AE for the diffusion of an isolated adatom is  .50 eV
 The AE for the diffusion of a dimer is  .47 eV
 The AE for the diffusion of ledge adatom along ledge is  .30 eV
 The hopping rate of the isolated adatom is    79629.700000
 The hopping rate of the ledge adatom is    1.824134E+08
 The hopping rate of the dimer is   165190.800000
 The possible motions of an isolated adatom are           4
 The possible motions of a dimer are           8
 The possible motions of a ledge adatom are           2
 The prefactor for the diffusion of isolated adatom is    2.000000E+13 Hz
 The prefactor for the diffusion of ledge adatom is    2.000000E+13 Hz
 The prefactor for the diffusion of dimer is    1.300000E+13 Hz
 The deposition flux is      200.000000 monolayer/sec
 The deposition rate is     8000000 atoms/sec
 The simulation grid is   200*  200 (atoms * atoms)
 You want to deposit    2.500000E-01monolayer(s) of atoms
 The simulation temperature is      300.000000 K
 -------------------------------------------------------------------------------
 
 Some Useful Information Got From The Simulation:
 -------------------------------------------------------------------------------
 
 The actual simulation time is    1.250576E-03 sec
 The total simulation steps are    11586941
 The initial number of atoms on the surface is           0
 The total number of deposited atoms is       10000
 The total number of atoms on the surface is       10000
 The total coverage is    2.500000E-01
 The total number of isolated adatoms is         313
 The total number of dimer atoms is          82
 The total number of ledge adatoms is          34
 _______________________________________________________________________________
 
 ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~
 
 You can visualize the film structure by XMOL, the file is: test.xyz            
 
 You can also visualize the film structure by RASMOL, the file is: test2.pdb    
        

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