mocmos.java

The ElectricTM VLSI Design System is an open-source Electronic Design Automation (EDA) system that c

						0x0000,   //
						0x1010,   //    X       X
						0x0000,   //
						0x0101,   //        X       X
						0x0000,   //
						0x1010,   //    X       X
						0x0000}));//

		/** P Well layer */
		wellLayers[P_TYPE] = Layer.newInstance(this, "P-Well",
			new EGraphics(true, true, null, 0, 139,99,46, 1,false,
			new int[] { 0x0202,   //       X       X
						0x0101,   //        X       X
						0x8080,   // X       X
						0x4040,   //  X       X
						0x2020,   //   X       X
						0x1010,   //    X       X
						0x0808,   //     X       X
						0x0404,   //      X       X
						0x0202,   //       X       X
						0x0101,   //        X       X
						0x8080,   // X       X
						0x4040,   //  X       X
						0x2020,   //   X       X
						0x1010,   //    X       X
						0x0808,   //     X       X
						0x0404}));//      X       X

		/** N Well implant */
		wellLayers[N_TYPE] = Layer.newInstance(this, "N-Well",
			new EGraphics(true, true, null, 0, 139,99,46, 1,false,
			new int[] { 0x0202,   //       X       X
						0x0000,   //
						0x2020,   //   X       X
						0x0000,   //
						0x0202,   //       X       X
						0x0000,   //
						0x2020,   //   X       X
						0x0000,   //
						0x0202,   //       X       X
						0x0000,   //
						0x2020,   //   X       X
						0x0000,   //
						0x0202,   //       X       X
						0x0000,   //
						0x2020,   //   X       X
						0x0000}));//

		/** poly cut layer */
		polyCutLayer = Layer.newInstance(this, "Poly-Cut",
			new EGraphics(false, false, null, 0, 100,100,100, 1,true,
			new int[] {0,0,0,0,0,0,0,0,0,0,0,0,0,0,0,0}));

		/** active cut layer */
		activeCutLayer = Layer.newInstance(this, "Active-Cut",
			new EGraphics(false, false, null, 0, 100,100,100, 1,true,
			new int[] {0,0,0,0,0,0,0,0,0,0,0,0,0,0,0,0}));

		/** via1->via5 layer */
        for (int i = 0; i < viaLayers.length; i++)
		    viaLayers[i] = Layer.newInstance(this, "Via"+(i+1),
                    new EGraphics(false, false, null, 0, 180,180,180, 1,true,
                            new int[] {0,0,0,0,0,0,0,0,0,0,0,0,0,0,0,0}));

		/** passivation layer */
		passivationLayer = Layer.newInstance(this, "Passivation",
			new EGraphics(true, true, null, 0, 100,100,100, 1,true,
			new int[] { 0x1C1C,   //    XXX     XXX
						0x3E3E,   //   XXXXX   XXXXX
						0x3636,   //   XX XX   XX XX
						0x3E3E,   //   XXXXX   XXXXX
						0x1C1C,   //    XXX     XXX
						0x0000,   //
						0x0000,   //
						0x0000,   //
						0x1C1C,   //    XXX     XXX
						0x3E3E,   //   XXXXX   XXXXX
						0x3636,   //   XX XX   XX XX
						0x3E3E,   //   XXXXX   XXXXX
						0x1C1C,   //    XXX     XXX
						0x0000,   //
						0x0000,   //
						0x0000}));//

		/** poly/trans layer */
		transistorPolyLayer = Layer.newInstance(this, "Transistor-Poly",
			new EGraphics(false, true, null, EGraphics.TRANSPARENT_2, 255,155,192, 1,true,
			new int[] { 0x1111,   //    X   X   X   X
						0xFFFF,   // XXXXXXXXXXXXXXXX
						0x1111,   //    X   X   X   X
						0x5555,   //  X X X X X X X X
						0x1111,   //    X   X   X   X
						0xFFFF,   // XXXXXXXXXXXXXXXX
						0x1111,   //    X   X   X   X
						0x5555,   //  X X X X X X X X
						0x1111,   //    X   X   X   X
						0xFFFF,   // XXXXXXXXXXXXXXXX
						0x1111,   //    X   X   X   X
						0x5555,   //  X X X X X X X X
						0x1111,   //    X   X   X   X
						0xFFFF,   // XXXXXXXXXXXXXXXX
						0x1111,   //    X   X   X   X
						0x5555}));//  X X X X X X X X

		/** poly cap layer */
		polyCapLayer = Layer.newInstance(this, "Poly-Cap",
			new EGraphics(false, false, null, 0, 0,0,0, 1,true,
			new int[] {0,0,0,0,0,0,0,0,0,0,0,0,0,0,0,0}));

		/** P act well layer */
		pActiveWellLayer = Layer.newInstance(this, "P-Active-Well",
			new EGraphics(false, true, null, EGraphics.TRANSPARENT_3, 107,226, 96,/*107,204,0,*/ 1,false,
			new int[] { 0x0000,   //
						0x0303,   //       XX      XX
						0x4848,   //  X  X    X  X
						0x0303,   //       XX      XX
						0x0000,   //
						0x3030,   //   XX      XX
						0x8484,   // X    X  X    X
						0x3030,   //   XX      XX
						0x0000,   //
						0x0303,   //       XX      XX
						0x4848,   //  X  X    X  X
						0x0303,   //       XX      XX
						0x0000,   //
						0x3030,   //   XX      XX
						0x8484,   // X    X  X    X
						0x3030}));//   XX      XX

		/** Silicide block */
        /** Resist Protection Oxide (RPO) Same graphics as in 90nm tech */
		silicideBlockLayer = Layer.newInstance(this, "Silicide-Block",
            new EGraphics(true, true, null, EGraphics.TRANSPARENT_2, 255,155,192,/*192,255,255,*/ 1,true,
            new int[] { 0x1010,  /*    X       X     */
                        0x2828,   /*   X X     X X    */
                        0x4444,   /*  X   X   X   X   */
                        0x8282,   /* X     X X     X  */
                        0x0101,   /*        X       X */
                        0x0000,   /*                  */
                        0x0000,   /*                  */
                        0x0000,   /*                  */
                        0x1010,   /*    X       X     */
                        0x2828,   /*   X X     X X    */
                        0x4444,   /*  X   X   X   X   */
                        0x8282,   /* X     X X     X  */
                        0x0101,   /*        X       X */
                        0x0000,   /*                  */
                        0x0000,   /*                  */
                        0x0000}));/*                  */


		/** Thick active */
		thickActiveLayer = Layer.newInstance(this, "Thick-Active",
			new EGraphics(true, true, null, 0, 0,0,0, 1,false,
			new int[] { 0x4040,   //  X       X
						0x8080,   // X       X
						0x0101,   //        X       X
						0x0202,   //       X       X
						0x0101,   //        X       X
						0x8080,   // X       X
						0x4040,   //  X       X
						0x2020,   //   X       X
						0x4040,   //  X       X
						0x8080,   // X       X
						0x0101,   //        X       X
						0x0202,   //       X       X
						0x0101,   //        X       X
						0x8080,   // X       X
						0x4040,   //  X       X
						0x2020}));//   X       X

		/** pad frame */
		padFrameLayer = Layer.newInstance(this, "Pad-Frame",
			new EGraphics(false, false, null, 0, 255,0,0, 1,false,
			new int[] {0,0,0,0,0,0,0,0,0,0,0,0,0,0,0,0}));

        createExtraLayers();

		// The layer functions
		metalLayers[0].setFunction(Layer.Function.METAL1);									// Metal-1
		metalLayers[1].setFunction(Layer.Function.METAL2);									// Metal-2
		metalLayers[2].setFunction(Layer.Function.METAL3);									// Metal-3
		metalLayers[3].setFunction(Layer.Function.METAL4);									// Metal-4
		metalLayers[4].setFunction(Layer.Function.METAL5);									// Metal-5
		metalLayers[5].setFunction(Layer.Function.METAL6);									// Metal-6
		poly1Layer.setFunction(Layer.Function.POLY1);									// Polysilicon-1
		poly2_lay.setFunction(Layer.Function.POLY2);									// Polysilicon-2
		activeLayers[P_TYPE].setFunction(Layer.Function.DIFFP);									// P-Active
		activeLayers[N_TYPE].setFunction(Layer.Function.DIFFN);									// N-Active
		selectLayers[P_TYPE].setFunction(Layer.Function.IMPLANTP);								// P-Select
		selectLayers[N_TYPE].setFunction(Layer.Function.IMPLANTN);								// N-Select
		wellLayers[P_TYPE].setFunction(Layer.Function.WELLP);									// P-Well
		wellLayers[N_TYPE].setFunction(Layer.Function.WELLN);									// N-Well
		polyCutLayer.setFunction(Layer.Function.CONTACT1, Layer.Function.CONPOLY);		// Poly-Cut
		activeCutLayer.setFunction(Layer.Function.CONTACT1, Layer.Function.CONDIFF);		// Active-Cut
		viaLayers[0].setFunction(Layer.Function.CONTACT2, Layer.Function.CONMETAL);			// Via-1
		viaLayers[1].setFunction(Layer.Function.CONTACT3, Layer.Function.CONMETAL);			// Via-2
		viaLayers[2].setFunction(Layer.Function.CONTACT4, Layer.Function.CONMETAL);			// Via-3
		viaLayers[3].setFunction(Layer.Function.CONTACT5, Layer.Function.CONMETAL);			// Via-4
		viaLayers[4].setFunction(Layer.Function.CONTACT6, Layer.Function.CONMETAL);			// Via-5
		passivationLayer.setFunction(Layer.Function.OVERGLASS);							// Passivation
		transistorPolyLayer.setFunction(Layer.Function.GATE);							// Transistor-Poly
		polyCapLayer.setFunction(Layer.Function.CAP);									// Poly-Cap
		pActiveWellLayer.setFunction(Layer.Function.DIFFP);								// P-Active-Well
		silicideBlockLayer.setFunction(Layer.Function.ART);								// Silicide-Block

		thickActiveLayer.setFunction(Layer.Function.DIFF, Layer.Function.THICK);			// Thick-Active
		padFrameLayer.setFunction(Layer.Function.ART);									// Pad-Frame
        if (pBaseLayer != null)
            pBaseLayer.setFunction(Layer.Function.BASE);
		Layer pseudoMetal1_lay = metalLayers[0].makePseudo();		// Pseudo-Metal-1
		Layer pseudoMetal2_lay = metalLayers[1].makePseudo();		// Pseudo-Metal-2
		Layer pseudoMetal3_lay = metalLayers[2].makePseudo();		// Pseudo-Metal-3
		Layer pseudoMetal4_lay = metalLayers[3].makePseudo();		// Pseudo-Metal-4
		Layer pseudoMetal5_lay = metalLayers[4].makePseudo();		// Pseudo-Metal-5
		Layer pseudoMetal6_lay = metalLayers[5].makePseudo();		// Pseudo-Metal-6
		Layer pseudoPoly1_lay = poly1Layer.makePseudo();            // Pseudo-Polysilicon-1
		Layer pseudoPoly2_lay = poly2_lay.makePseudo();             // Pseudo-Polysilicon-2
		pseudoActiveLayers[P_TYPE] = activeLayers[P_TYPE].makePseudo();		// Pseudo-P-Active
		pseudoActiveLayers[N_TYPE] = activeLayers[N_TYPE].makePseudo();		// Pseudo-N-Active
		pseudoSelectLayers[P_TYPE] = selectLayers[P_TYPE].makePseudo();	// Pseudo-P-Select
		pseudoSelectLayers[N_TYPE] = selectLayers[N_TYPE].makePseudo();	// Pseudo-N-Select
		pseudoWellLayers[P_TYPE] = wellLayers[P_TYPE].makePseudo();		// Pseudo-P-Well
		pseudoWellLayers[N_TYPE] = wellLayers[N_TYPE].makePseudo();		// Pseudo-N-Well

		// The CIF names
		metalLayers[0].setFactoryCIFLayer("CMF");				// Metal-1
		metalLayers[1].setFactoryCIFLayer("CMS");				// Metal-2
		metalLayers[2].setFactoryCIFLayer("CMT");				// Metal-3
		metalLayers[3].setFactoryCIFLayer("CMQ");				// Metal-4
		metalLayers[4].setFactoryCIFLayer("CMP");				// Metal-5
		metalLayers[5].setFactoryCIFLayer("CM6");				// Metal-6
		poly1Layer.setFactoryCIFLayer("CPG");				// Polysilicon-1
		poly2_lay.setFactoryCIFLayer("CEL");				// Polysilicon-2
		activeLayers[P_TYPE].setFactoryCIFLayer("CAA");				// P-Active
		activeLayers[N_TYPE].setFactoryCIFLayer("CAA");				// N-Active
		selectLayers[P_TYPE].setFactoryCIFLayer("CSP");				// P-Select
		selectLayers[N_TYPE].setFactoryCIFLayer("CSN");				// N-Select
		wellLayers[P_TYPE].setFactoryCIFLayer("CWP");				// P-Well
		wellLayers[N_TYPE].setFactoryCIFLayer("CWN");				// N-Well
		polyCutLayer.setFactoryCIFLayer("CCC");				// Poly-Cut
		activeCutLayer.setFactoryCIFLayer("CCC");			// Active-Cut
		viaLayers[0].setFactoryCIFLayer("CVA");					// Via-1
		viaLayers[1].setFactoryCIFLayer("CVS");					// Via-2
		viaLayers[2].setFactoryCIFLayer("CVT");					// Via-3
		viaLayers[3].setFactoryCIFLayer("CVQ");					// Via-4
		viaLayers[4].setFactoryCIFLayer("CV5");					// Via-5
		passivationLayer.setFactoryCIFLayer("COG");			// Passivation
		transistorPolyLayer.setFactoryCIFLayer("CPG");		// Transistor-Poly
		polyCapLayer.setFactoryCIFLayer("CPC");				// Poly-Cap
		pActiveWellLayer.setFactoryCIFLayer("CAA");			// P-Active-Well
		silicideBlockLayer.setFactoryCIFLayer("CSB");		// Silicide-Block
		thickActiveLayer.setFactoryCIFLayer("CTA");			// Thick-Active
		padFrameLayer.setFactoryCIFLayer("XP");				// Pad-Frame