rcmos.java

The ElectricTM VLSI Design System is an open-source Electronic Design Automation (EDA) system that c

//						0x0101,   //        X       X
//						0x0202,   //       X       X
//						0x0404,   //      X       X 
//						0x0808,   //     X       X  
//						0x1010,   //    X       X   
//						0x2020,   //   X       X    
//						0x4040,   //  X       X     
//						0x8080,   // X       X      
//						0x0101,   //        X       X
//						0x0202,   //       X       X
//						0x0404,   //      X       X 
//						0x0808}));//     X       X  
//
//		/** Pseudo-Polysilicon layer */
//		Layer pseudoPolysilicon_lay = Layer.newInstance(this, "Pseudo-Polysilicon",
//			new EGraphics(false, false, null, EGraphics.TRANSPARENT_2, 255,155,192,0.8,true,
//			new int[] { 0x0808,   //     X       X   
//						0x0404,   //      X       X  
//						0x0202,   //       X       X 
//						0x0101,   //        X       X
//						0x8080,   // X       X       
//						0x4040,   //  X       X      
//						0x2020,   //   X       X     
//						0x1010,   //    X       X    
//						0x0808,   //     X       X   
//						0x0404,   //      X       X  
//						0x0202,   //       X       X 
//						0x0101,   //        X       X
//						0x8080,   // X       X       
//						0x4040,   //  X       X      
//						0x2020,   //   X       X     
//						0x1010}));//    X       X    
//
//		/** Pseudo-S-Active layer */
//		Layer pseudoSActive_lay = Layer.newInstance(this, "Pseudo-S-Active",
//			new EGraphics(false, false, null, EGraphics.TRANSPARENT_3, 107,226,96,0.8,true,
//			new int[] { 0x0000,   //                 
//						0x0303,   //       XX      XX
//						0x4848,   //  X  X    X  X   
//						0x0303,   //       XX      XX
//						0x0000,   //                 
//						0x3030,   //   XX      XX    
//						0x8484,   // X    X  X    X  
//						0x3030,   //   XX      XX    
//						0x0000,   //                 
//						0x0303,   //       XX      XX
//						0x4848,   //  X  X    X  X   
//						0x0303,   //       XX      XX
//						0x0000,   //                 
//						0x3030,   //   XX      XX    
//						0x8484,   // X    X  X    X  
//						0x3030}));//   XX      XX    
//
//		/** Pseudo-D-Active layer */
//		Layer pseudoDActive_lay = Layer.newInstance(this, "Pseudo-D-Active",
//			new EGraphics(false, false, null, EGraphics.TRANSPARENT_3, 107,226,96,0.8,true,
//			new int[] { 0x0000,   //                 
//						0x0303,   //       XX      XX
//						0x4848,   //  X  X    X  X   
//						0x0303,   //       XX      XX
//						0x0000,   //                 
//						0x3030,   //   XX      XX    
//						0x8484,   // X    X  X    X  
//						0x3030,   //   XX      XX    
//						0x0000,   //                 
//						0x0303,   //       XX      XX
//						0x4848,   //  X  X    X  X   
//						0x0303,   //       XX      XX
//						0x0000,   //                 
//						0x3030,   //   XX      XX    
//						0x8484,   // X    X  X    X  
//						0x3030}));//   XX      XX    
//
//		/** Pseudo-Select layer */
//		Layer pseudoSelect_lay = Layer.newInstance(this, "Pseudo-Select",
//			new EGraphics(true, true, null, 0, 255,255,0,0.8,true,
//			new int[] { 0x1010,   //    X       X    
//						0x2020,   //   X       X     
//						0x4040,   //  X       X      
//						0x8080,   // X       X       
//						0x0101,   //        X       X
//						0x0202,   //       X       X 
//						0x0404,   //      X       X  
//						0x0808,   //     X       X   
//						0x1010,   //    X       X    
//						0x2020,   //   X       X     
//						0x4040,   //  X       X      
//						0x8080,   // X       X       
//						0x0101,   //        X       X
//						0x0202,   //       X       X 
//						0x0404,   //      X       X  
//						0x0808}));//     X       X                    
//
//		/** Pseudo-Well layer */
//		Layer pseudoWell_lay = Layer.newInstance(this, "Pseudo-Well",
//			new EGraphics(false, false, null, EGraphics.TRANSPARENT_4, 240,221,181,0.8,true,
//			new int[] { 0x0000,   //                 
//						0x00c0,   //         XX      
//						0x0000,   //                 
//						0x0000,   //                 
//						0x0000,   //                 
//						0x00c0,   //         XX      
//						0x0000,   //                 
//						0x0000,   //                 
//						0x0000,   //                 
//						0x00c0,   //         XX      
//						0x0000,   //                 
//						0x0000,   //                 
//						0x0000,   //                 
//						0x00c0,   //         XX      
//						0x0000,   //                 
//						0x0000}));//                 

		// The layer functions
		metal1_lay.setFunction(Layer.Function.METAL1);									// Metal-1
		metal2_lay.setFunction(Layer.Function.METAL2);									// Metal-2
		polysilicon_lay.setFunction(Layer.Function.POLY1);								// Polysilicon
		sActive_lay.setFunction(Layer.Function.DIFF);									// S-Active
		dActive_lay.setFunction(Layer.Function.DIFF);									// D-Active
		select_lay.setFunction(Layer.Function.IMPLANTP);								// Select
		well_lay.setFunction(Layer.Function.WELLP);										// Well
		cut_lay.setFunction(Layer.Function.CONTACT1);									// Contact-Cut
		via_lay.setFunction(Layer.Function.CONTACT2);									// Via
		passivation_lay.setFunction(Layer.Function.OVERGLASS);							// Passivation
		polyCut_lay.setFunction(Layer.Function.CONTACT1);								// Poly-Cut
		activeCut_lay.setFunction(Layer.Function.CONTACT1);								// Active-Cut
		Layer pseudoMetal1_lay = metal1_lay.makePseudo();			// Pseudo-Metal-1
		Layer pseudoMetal2_lay = metal2_lay.makePseudo();			// Pseudo-Metal-2
		Layer pseudoPolysilicon_lay = polysilicon_lay.makePseudo();	// Pseudo-Polysilicon
		Layer pseudoSActive_lay = sActive_lay.makePseudo();			// Pseudo-S-Active
		Layer pseudoDActive_lay = dActive_lay.makePseudo();			// Pseudo-D-Active
		Layer pseudoSelect_lay = select_lay.makePseudo();			// Pseudo-Select
		Layer pseudoWell_lay = well_lay.makePseudo();				// Pseudo-Well
//		pseudoMetal1_lay.setFunction(Layer.Function.METAL1, Layer.Function.PSEUDO);		// Pseudo-Metal-1
//		pseudoMetal2_lay.setFunction(Layer.Function.METAL2, Layer.Function.PSEUDO);		// Pseudo-Metal-2
//		pseudoPolysilicon_lay.setFunction(Layer.Function.POLY1, Layer.Function.PSEUDO);	// Pseudo-Polysilicon
//		pseudoSActive_lay.setFunction(Layer.Function.DIFF, Layer.Function.PSEUDO);		// Pseudo-S-Active
//		pseudoDActive_lay.setFunction(Layer.Function.DIFF, Layer.Function.PSEUDO);		// Pseudo-D-Active
//		pseudoSelect_lay.setFunction(Layer.Function.IMPLANTP, Layer.Function.PSEUDO);	// Pseudo-Select
//		pseudoWell_lay.setFunction(Layer.Function.WELLP, Layer.Function.PSEUDO);		// Pseudo-Well

        // 3D values. Same values as in mocmos
        metal1_lay.setFactory3DInfo(2.65, 16.5, "NONE", 0.2);
        metal2_lay.setFactory3DInfo(2.65, 22.15, "NONE", 0.2);
        polysilicon_lay.setFactory3DInfo(1, 14.75, "NONE", 0.2);
        sActive_lay.setFactory3DInfo(4, 9, "NONE", 0.2);
        dActive_lay.setFactory3DInfo(4, 9, "NONE", 0.2);
        select_lay.setFactory3DInfo(5, 8, "NONE", 0.2);
        well_lay.setFactory3DInfo(13, 0, "NONE", 0.2);
        cut_lay.setFactory3DInfo(3.5, 13, "NONE", 0.2);
        via_lay.setFactory3DInfo(3, 19.15, "NONE", 0.2);
        passivation_lay.setFactory3DInfo(5, 19.15, "NONE", 0.2);
        polyCut_lay.setFactory3DInfo(0.75, 15.75, "NONE", 0.2);
        activeCut_lay.setFactory3DInfo(3.5, 13, "NONE", 0.2);

        // The CIF names
		metal1_lay.setFactoryCIFLayer("CMF");			// Metal-1
		metal2_lay.setFactoryCIFLayer("CMS");			// Metal-2
		polysilicon_lay.setFactoryCIFLayer("CPG");		// Polysilicon
		sActive_lay.setFactoryCIFLayer("CAA");			// S-Active
		dActive_lay.setFactoryCIFLayer("CAA");			// D-Active
		select_lay.setFactoryCIFLayer("CSG");			// Select
		well_lay.setFactoryCIFLayer("CWG");				// Well
		cut_lay.setFactoryCIFLayer("CC");				// Contact-Cut
		via_lay.setFactoryCIFLayer("CVA");				// Via
		passivation_lay.setFactoryCIFLayer("COG");		// Passivation
		polyCut_lay.setFactoryCIFLayer("CCP");			// Poly-Cut
		activeCut_lay.setFactoryCIFLayer("CCA");		// Active-Cut
//		pseudoMetal1_lay.setFactoryCIFLayer("");		// Pseudo-Metal-1
//		pseudoMetal2_lay.setFactoryCIFLayer("");		// Pseudo-Metal-2
//		pseudoPolysilicon_lay.setFactoryCIFLayer("");	// Pseudo-Polysilicon
//		pseudoSActive_lay.setFactoryCIFLayer("");		// Pseudo-S-Active
//		pseudoDActive_lay.setFactoryCIFLayer("");		// Pseudo-D-Active
//		pseudoSelect_lay.setFactoryCIFLayer("");		// Pseudo-Select
//		pseudoWell_lay.setFactoryCIFLayer("");			// Pseudo-Well

		//******************** ARCS ********************

		/** Metal-1 arc */
		ArcProto metal1_arc = newArcProto("Metal-1", 0, 3, ArcProto.Function.METAL1,
			new Technology.ArcLayer(metal1_lay, 3, Poly.Type.FILLED)
		);
		metal1_arc.setFactoryFixedAngle(false);
		metal1_arc.setCurvable();
		metal1_arc.setExtended(false);
		metal1_arc.setFactoryAngleIncrement(0);

		/** Metal-2 arc */
		ArcProto metal2_arc = newArcProto("Metal-2", 0, 3, ArcProto.Function.METAL2,
			new Technology.ArcLayer(metal2_lay, 3, Poly.Type.FILLED)
		);
//		metal2_arc.setFunction(ArcProto.Function.METAL1);
		metal2_arc.setFactoryFixedAngle(false);
		metal2_arc.setCurvable();
		metal2_arc.setExtended(false);
		metal2_arc.setFactoryAngleIncrement(0);

		/** Polysilicon arc */
		ArcProto polysilicon_arc = newArcProto("Polysilicon", 0, 2, ArcProto.Function.POLY1,
			new Technology.ArcLayer(polysilicon_lay, 2, Poly.Type.FILLED)
		);
//		polysilicon_arc.setFunction(ArcProto.Function.METAL1);
		polysilicon_arc.setFactoryFixedAngle(false);
		polysilicon_arc.setCurvable();
		polysilicon_arc.setExtended(false);
		polysilicon_arc.setFactoryAngleIncrement(0);

		/** S-Active arc */
		ArcProto sActive_arc = newArcProto("S-Active", 4, 6, ArcProto.Function.DIFFN,
			new Technology.ArcLayer(sActive_lay, 2, Poly.Type.FILLED),
			new Technology.ArcLayer(select_lay, 6, Poly.Type.FILLED)
		);
		sActive_arc.setFactoryFixedAngle(false);
		sActive_arc.setCurvable();
		sActive_arc.setExtended(false);
		sActive_arc.setFactoryAngleIncrement(0);

		/** D-Active arc */
		ArcProto dActive_arc = newArcProto("D-Active", 8, 10, ArcProto.Function.DIFFP,
			new Technology.ArcLayer(dActive_lay, 2, Poly.Type.FILLED),
			new Technology.ArcLayer(well_lay, 10, Poly.Type.FILLED)
		);
		dActive_arc.setFactoryFixedAngle(false);
		dActive_arc.setCurvable();
		dActive_arc.setExtended(false);
		dActive_arc.setFactoryAngleIncrement(0);

		/** Substrate-Active arc */
		ArcProto substrateActive_arc = newArcProto("Substrate-Active", 0, 2, ArcProto.Function.DIFFS,
			new Technology.ArcLayer(dActive_lay, 2, Poly.Type.FILLED),
			new Technology.ArcLayer(sActive_lay, 2, Poly.Type.FILLED)
		);
		substrateActive_arc.setFactoryFixedAngle(false);
		substrateActive_arc.setCurvable();
		substrateActive_arc.setExtended(false);
		substrateActive_arc.setFactoryAngleIncrement(0);

		/** Well arc */
		ArcProto wellActive_arc = newArcProto("Well-Active", 4, 6, ArcProto.Function.DIFFW,
			new Technology.ArcLayer(dActive_lay, 2, Poly.Type.FILLED),
			new Technology.ArcLayer(sActive_lay, 2, Poly.Type.FILLED),
			new Technology.ArcLayer(well_lay, 6, Poly.Type.FILLED),
			new Technology.ArcLayer(select_lay, 6, Poly.Type.FILLED)
		);
		wellActive_arc.setFactoryFixedAngle(false);
		wellActive_arc.setCurvable();
		wellActive_arc.setExtended(false);
		wellActive_arc.setFactoryAngleIncrement(0);

		/** S-Transistor arc */
		ArcProto sTransistor_arc = newArcProto("S-Transistor", 4, 6, ArcProto.Function.DIFFN,
			new Technology.ArcLayer(dActive_lay, 2, Poly.Type.FILLED),
			new Technology.ArcLayer(polysilicon_lay, 2, Poly.Type.FILLED),
			new Technology.ArcLayer(select_lay, 6, Poly.Type.FILLED)
		);
		sTransistor_arc.setFactoryFixedAngle(false);
		sTransistor_arc.setCurvable();
		sTransistor_arc.setExtended(false);
		sTransistor_arc.setFactoryAngleIncrement(0);

		/** D-Transistor arc */
		ArcProto dTransistor_arc = newArcProto("D-Transistor", 8, 10, ArcProto.Function.DIFFP,
			new Technology.ArcLayer(dActive_lay, 2, Poly.Type.FILLED),
			new Technology.ArcLayer(polysilicon_lay, 2, Poly.Type.FILLED),
			new Technology.ArcLayer(well_lay, 10, Poly.Type.FILLED)
		);
		dTransistor_arc.setFactoryFixedAngle(false);
		dTransistor_arc.setCurvable();
		dTransistor_arc.setExtended(false);
		dTransistor_arc.setFactoryAngleIncrement(0);

		//******************** NODES ********************

		/** Metal-1-Pin */
		PrimitiveNode metal1Pin_node = PrimitiveNode.newInstance("Metal-1-Pin", this, 3, 3, null,