📄 pullup.cir
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BICMOS INVERTER PULLUP CIRCUITVDD 1 0 5.0VVSS 2 0 0.0VVIN 3 0 0.75VVC 1 11 0.0VVB 5 15 0.0VQ1 11 15 4 M_NPN AREA=4M1 5 3 1 1 M_PMOS W=20U L=2U AD=30P AS=30P PD=21U PS=21UCL 4 0 5.0PF.IC V(4)=0.75V V(5)=0.0V.MODEL M_PMOS PMOS VTO=-0.8 UO=250 TOX=25N NSUB=5E16+ UCRIT=10K UEXP=.15 VMAX=50K NEFF=2 XJ=.02U+ LD=.15U CGSO=.1N CGDO=.1N CJ=.12M MJ=0.5+ CJSW=0.3N MJSW=0.5 LEVEL=2.MODEL M_NPN NBJT LEVEL=2+ TITLE TWO-DIMENSIONAL NUMERICAL POLYSILICON EMITTER BIPOLAR TRANSISTOR+ $ SINCE ONLY HALF THE DEVICE IS SIMULATED, DOUBLE THE UNIT WIDTH TO GET+ $ 1.0 UM EMITTER.+ OPTIONS DEFW=2.0U+ OUTPUT STATISTICS+ + X.MESH W=2.0 H.E=0.02 H.M=0.5 R=2.0+ X.MESH W=0.5 H.S=0.02 H.M=0.2 R=2.0+ + Y.MESH L=-0.2 N=1+ Y.MESH L= 0.0 N=5+ Y.MESH W=0.10 H.E=0.004 H.M=0.05 R=2.5+ Y.MESH W=0.15 H.S=0.004 H.M=0.02 R=2.5+ Y.MESH W=1.05 H.S=0.02 H.M=0.1 R=2.5++ DOMAIN NUM=1 MATERIAL=1 X.L=2.0 Y.H=0.0+ DOMAIN NUM=2 MATERIAL=2 X.H=2.0 Y.H=0.0+ DOMAIN NUM=3 MATERIAL=3 Y.L=0.0+ MATERIAL NUM=1 POLYSILICON+ MATERIAL NUM=2 OXIDE+ MATERIAL NUM=3 SILICON++ ELEC NUM=1 X.L=0.0 X.H=0.0 Y.L=1.1 Y.H=1.3+ ELEC NUM=2 X.L=0.0 X.H=0.5 Y.L=0.0 Y.H=0.0+ ELEC NUM=3 X.L=2.0 X.H=3.0 Y.L=-0.2 Y.H=-0.2++ DOPING GAUSS N.TYPE CONC=3E20 X.L=2.0 X.H=3.0 Y.L=-0.2 Y.H=0.0+ + CHAR.L=0.047 LAT.ROTATE+ DOPING GAUSS P.TYPE CONC=5E18 X.L=0.0 X.H=5.0 Y.L=-0.2 Y.H=0.0+ + CHAR.L=0.100 LAT.ROTATE+ DOPING GAUSS P.TYPE CONC=1E20 X.L=0.0 X.H=0.5 Y.L=-0.2 Y.H=0.0+ + CHAR.L=0.100 LAT.ROTATE RATIO=0.7+ DOPING UNIF N.TYPE CONC=1E16 X.L=0.0 X.H=5.0 Y.L=0.0 Y.H=1.3+ DOPING GAUSS N.TYPE CONC=5E19 X.L=0.0 X.H=5.0 Y.L=1.3 Y.H=1.3+ + CHAR.L=0.100 LAT.ROTATE++ METHOD AC=DIRECT ITLIM=10+ MODELS BGN SRH AUGER CONCTAU CONCMOB FIELDMOB.TRAN 0.5NS 4.0NS.PRINT TRAN V(3) V(4).OPTION ACCT BYPASS=1.END
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