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Date: Mon, 25 Nov 1996 23:11:47 GMT
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<HTML><HEAD><title>Pramod Khargonekar</title></HEAD><BODY BGCOLOR="#333366" text="#FFFF66" link="#FFFFFF"vlink="#CCCCFF" alink="FF0084"><!WA0><IMG SRC="http://www.eecs.umich.edu/systems/pramod.jpg"><H1>Pramod P. Khargonekar</H1><H3><!WA1><A HREF="http://www.umich.edu/">University of Michigan</A><br>Arthur F. Thurnau Professor and<br> Associate Chair,<br> Dept. of<!WA2><A HREF="http://www.eecs.umich.edu/">ElectricalEngineering and Computer Science,</A><br>Chair, <!WA3><A HREF="http://www.eecs.umich.edu/systems/">Systems Division</A>of EECS<br>NSF Young Investigator<br>IEEE Fellow</H3><br><hr><b>E-mail:</b> <!WA4><AHREF="mailto:pramod@eecs.umich.edu">pramod@eecs.umich.edu</A><br><b>Mail:</b>Department of EECS, University of Michigan, 1301 BealAvenue, Ann Arbor, MI 48109-2122, USA<br><b>Tel.:</b> (313) 764-4328<br><b>Secretary Tel.:</b> (313) 763-8040<br><b>Fax:</b> (313) 763-8041<br><b><!WA5><AHREF="http://www.eecs.umich.edu/systems/PKcv.html">CurriculumVitae:</A></b><br><hr><H2>Research Activities</H2><p>My major research interests cover a broad range of topics in the generalarea of systems and contro. Given the rapidly changing scenario inresearch, I believe that a healthy mix of theory and applications isperhaps the most appropriate strategy. Currently, with my students and I ammost actively working on the following topics:<UL><LI>Applications of Control Technology to Microelectronics ManufacturingProcesses<LI>Robust Control Theory<LI>Control Oriented Identification and Modeling<LI>Applications of Control to Automotive, Xerography, and Electromechanicalsystems</UL><p>In a major interdisciplinary research thrust, a group of faculty from thecontrol systems laboratory and the solid state electronics laboratory hasstarted a new research program on applications of control technology tosemiconductor and display manufacturing processes. We have several projectsin this area. I am the Center Director for the MURI Center on IntelligentElectronics Manufacturing. The main research thrusts of this centerinclude modeling, sensing, and control of plasma etching and depositionprocesses. I am also a Thrust Group Leader in the Center for DisplayTechnology and Manufacturing and a participating faculty member in the SRCCenter of Excellence on Automated Semiconductor Manufacturing. Theseactivities are also focused on applications of modern control and systemstheory to plasma based microelectronics manufacturing processes. In ourinitial work, we have focused on real time and run-to-run control of plasmareactive ion etching process which is a major unit process step. Startingfrom a conceptual control strategy, we have designed and implemented a realtime control system for this process on an Applied 8300 Hexode reactor.Experimental results have shown that real time feedback control could havemajor impact on the performance characteristics of the reactive ionetchers. More recently, we have developed nonlinear estimators forcalculating etch rate from single/multiple wavelegth laser inteferometers.We have also developed a combined run-to-run and real-time controller forthe RIE process.<p>In control theory, our research is analysis and synthesis of controlsystems that give optimal performance given an approximate model of thephysical system to be controlled. This is an extremely important problemsince in practice one rarely has an exact model for the physical system.Modeling uncertainty arises due to incomplete and inexact experimentaldata, simplifying approximations, neglected high frequency dynamics, etc.Our research has focused on the problem of robust stabilization for avariety of possible modeling uncertainties. Our results have yieldednecessary and sufficient conditions for the solvability of robuststabilization problems and constructive algorithms for solving theseproblems. This research is also closely connected to our work on H-infinityoptimal control. A new development in our research on robust control is theanalysis and synthesis of robust sampled-data control systems. Here wehave focused on developing analytical tools for robustness analysis andsynthesis of sampled-data systems in H-two and H-infinity norm.<p>Models are the basis for much of control systems analysis and design. In anew major effort, we have begun research in empirical model building, i.e., system identification. We are exploring frequency domain techniques forbuilding system models which are suitable for robust control analysis anddesign. We have applied some of this recent work to the reactive ionetching problem as well as to the JPL example. More recent work has focusedstructured nonlinear models, such as Hammerstein systems, from empiricaldata.<p>We are also actively pursuing applications of modern control andsystems techniques to automotive systems. Our initial work focused on anidle speed fluctuation reduction problem where a novel nonlinear controlstrategy has given promising results on nonlinearsimulations. More recently, we have focused on modeling and control ofsingle and double transition shift transmissions. This work is being donein collaboration with engineers from General Motors.<p>In collaboration with engineers at Xerox and Professor Dan Koditschek, wehave started a new project on control of the color xerography process.<p>For more details, you are invited to read our publications on these topics.<br><H3><!WA6><AHREF="http://www.eecs.umich.edu/systems/PKpapers.html">SelectedPublications</A></H3><H2>Research Groups</H2><UL><LI><!WA7><A HREF="http://www.engin.umich.edu/research/controls/">ControlsGroup</A><LI><!WA8><A HREF="http://dtm.eecs.umich.edu/">Center for DisplayTechnology & Manufacturing</A></UL></BODY><HR><ADDRESS><BR><B>Updated </B><I>April 1996</I> <B>by BethOlsen</B></A></ADDRESS><!WA9><a href="http://www.eecs.umich.edu/cgi-bin/imagemap/systems/coebanner.map"><!WA10><IMG SRC="http://www.eecs.umich.edu/systems/coebanner.gif" ismap alt="University of Michigan College of Engineering"></a></html>⌨️ 快捷键说明
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